Gas Permeation through Nafion. Part 2: Resistor Network Model

Washington, DC / American Chemical Society (2015) [Journal Article]

The journal of physical chemistry / C
Volume: 119
Issue: 45
Page(s): 25156-25169

Authors

Authors

Schalenbach, Maximilian
Hoeh, Michael A.
Gostick, Jeff T.
Lueke, Wiebke
Stolten, Detlef

Identifier